Yoh Tanaka

Title: Innovations of Yoh Tanaka

Introduction

Yoh Tanaka is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of plasma processing technology. His work has implications for electronic device manufacturing, showcasing his expertise and innovative spirit.

Latest Patents

Yoh Tanaka holds a patent for a "Plasma processing apparatus and electronic device manufacturing method." This invention includes a chamber, substrate stage, electrode, conductive members, and a deposition shield. The chamber is maintained at a predetermined potential, while the substrate stage holds a substrate within the chamber. The electrode generates plasma inside the chamber by applying AC power. The conductive members connect the substrate stage and the chamber's side wall, surrounding the plasma space during plasma formation. Some of these members can be moved by a driving mechanism to create an opening for substrate loading when no plasma is formed. The deposition shield protects the surfaces of the conductive members facing the plasma space.

Career Highlights

Yoh Tanaka is associated with Canon Anelva Corporation, where he continues to innovate in the field of plasma processing. His work is crucial for advancements in electronic device manufacturing, reflecting his commitment to technological progress.

Collaborations

Tanaka collaborates with notable colleagues such as Kazuya Konaga and Eisaku Watanabe. Their teamwork enhances the innovative capabilities within their projects.

Conclusion

Yoh Tanaka's contributions to plasma processing technology exemplify his role as a leading inventor in the field. His patent and collaborations highlight the importance of innovation in electronic device manufacturing.