Yixuan Wu

Title: Yixuan Wu: Innovator in Graphene Film Patterning

Introduction

Yixuan Wu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of materials science, particularly in the area of graphene technology. His innovative work focuses on the patterning of graphene films, which has important implications for various applications in electronics and nanotechnology.

Latest Patents

Yixuan Wu holds a patent titled "Method for implementing and regulating patterning of a graphene film by ultraviolet photo-oxidation." This patent describes a method that includes several key steps. First, it involves implementing the patterning of a graphene film micron structure pattern using a xenon lamp excimer ultraviolet photo-oxidation vacuum apparatus and a hard mask. Second, it controls oxygen excitons by applying a non-uniform magnetic field on the surface of the graphene film in a vertical direction. This approach enhances the directivity of etching to the graphene film, thereby improving the patterning quality. Lastly, by adjusting the intensity and direction of the magnetic field, the movement of the oxygen excitons is controlled, allowing for precise shaping of the etched pattern structure of the graphene film.

Career Highlights

Yixuan Wu is affiliated with Shanghai Jiao Tong University, where he continues to advance his research in graphene technology. His work has garnered attention for its innovative approach to enhancing the quality of graphene film patterning. With a focus on practical applications, Wu's research contributes to the growing field of nanotechnology.

Collaborations

Some of Yixuan Wu's notable coworkers include Haihua Tao and Xianfeng Chen. Their collaborative efforts in research have furthered the understanding and application of graphene materials.

Conclusion

Yixuan Wu is a key figure in the development of advanced methods for graphene film patterning. His innovative patent and ongoing research at Shanghai Jiao Tong University highlight his commitment to pushing the boundaries of materials science. His contributions are paving the way for future advancements in technology.