Company Filing History:
Years Active: 2019
Title: Yiqun Tan: Innovator in Hotspot Correction Methods
Introduction
Yiqun Tan is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of microelectronics, particularly in the development of methods that enhance the accuracy of layout patterns in semiconductor manufacturing.
Latest Patents
Yiqun Tan holds a patent for a "Hotspot correction method." This innovative method provides a solution for accurately correcting layout patterns in hotspot regions using an ILT (Inverse Lithography Technology) method. The layout patterns in the extension regions are then corrected using an OPC (Optical Proximity Correction) method. This dual approach ensures that while the hotspot regions are accurately corrected, any pattern distortion in the extension regions caused by the regional ILT correction is prevented. Additionally, this method avoids the high demands of calculation capability and long calculation times typically associated with global ILT correction.
Career Highlights
Yiqun Tan is currently employed at Shanghai Huali Microelectronics Corporation, where he continues to push the boundaries of innovation in microelectronics. His work has been instrumental in improving the efficiency and accuracy of semiconductor manufacturing processes.
Collaborations
Yiqun Tan collaborates with talented individuals in his field, including coworkers Shirui Yu and Xuan Zhao. Their combined expertise contributes to the advancement of technologies in microelectronics.
Conclusion
Yiqun Tan's contributions to hotspot correction methods exemplify his commitment to innovation in the semiconductor industry. His work not only enhances the accuracy of layout patterns but also streamlines the manufacturing process, showcasing the importance of inventive solutions in technology.