Shrewsbury, MA, United States of America

Yinjie Cen

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):

Title: The Innovations of Yinjie Cen in UV-Curing Resin Technologies

Introduction

Yinjie Cen is an accomplished inventor based in Shrewsbury, MA, known for his contributions to advanced materials technology. With one patent to his name, Cen's work focuses on enhancing the performance of materials used in optical displays, showcasing his expertise in the field of UV-curing resins.

Latest Patents

Yinjie Cen's notable patent is titled "UV-curing resin compositions for hard coat applications." This patent discloses an actinic radiation curable (meth)acrylic composition specifically designed for hardcoats used in optical displays. The composition includes a combination of multifunctional (meth)acrylate monomers, Si-containing (meth)acrylate monomers, UV radical initiators, surface cure improving monomers, nanoparticles, and organic solvents. The resulting coated hardcoat articles demonstrate significantly improved properties, making them particularly valuable for display applications.

Career Highlights

Cen's career milestones include his role at DuPont Electronics, Inc., a leading company in the electronics and materials sector. His work at DuPont has been pivotal in developing innovative solutions that cater to the evolving demands of technological advancements in display technologies.

Collaborations

Throughout his career, Yinjie Cen has collaborated with esteemed colleagues such as Michael Mulzer and Kenneth Hernandez. These collaborations have fostered an environment of innovation and creativity, contributing to the successful development of advanced materials and technologies.

Conclusion

Yinjie Cen's innovative approach and expertise in UV-curing resins position him as a valuable contributor to the field of optical display technologies. With his ongoing work at DuPont Electronics, he continues to push the boundaries of material sciences and enhance the performance of display applications for future innovations.

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