Location History:
- Pougheepsie, NY (US) (2004)
- Poughkeepsie, NY (US) (2004)
Company Filing History:
Years Active: 2004
Title: Innovations of Yingru Gu in Chemical-Mechanical Polishing
Introduction
Yingru Gu is a notable inventor based in Poughkeepsie, NY (US), recognized for his contributions to the field of chemical-mechanical polishing (CMP). With a total of two patents to his name, Gu has made significant advancements that enhance the efficiency and reliability of CMP processes.
Latest Patents
One of Gu's latest patents is titled "Endpoint detection in chemical-mechanical polishing of patterned wafers having a low pattern density." This innovation involves a CMP system and method that pumps polishing slurry through a sampling tube to an endpoint detection apparatus during polishing operations. The system includes a flushing mechanism for the sampling tube, which is activated based on control signals from the endpoint detection apparatus. This design eliminates clogging and contamination, ensuring robust operation and reliable endpoint detection, even for low pattern density films.
Another significant patent is "Technique for noise reduction in a torque-based chemical-mechanical polishing endpoint detection system." This method focuses on reducing noise in a CMP endpoint detection system that utilizes torque measurement. By adjusting the sampling rate and sample size, and averaging the torque signals, periodic noise can be effectively removed. This advancement allows for reliable, closed-loop control of the CMP process.
Career Highlights
Yingru Gu is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of CMP. His work has contributed to the development of more efficient and effective polishing techniques, which are crucial in semiconductor manufacturing.
Collaborations
Gu has collaborated with notable coworkers, including Xinhui Wang and Leping Li, who have also contributed to advancements in CMP technologies.
Conclusion
Yingru Gu's innovative patents and contributions to chemical-mechanical polishing demonstrate his significant impact on the industry. His work continues to enhance the reliability and efficiency of CMP processes, making him a valuable inventor in this field.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.