Fremont, CA, United States of America

Ying Yin Hui


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations by Ying Yin Hui

Introduction

Ying Yin Hui is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of sputtering technology, particularly in improving sidewall coverage during the deposition process. His innovative approach has led to the development of a patented method that enhances material application in various industrial applications.

Latest Patents

Ying Yin Hui holds a patent titled "Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma." This patent focuses on increasing sidewall coverage by a sputtered material through the generation of an ionizing plasma in a relatively low pressure sputtering gas. By reducing the pressure of the sputtering gas, the ionization rate of the deposition material is decreased, which in turn enhances sidewall coverage while maintaining sufficient bottom coverage. Additionally, the patent explores an alternative embodiment that allows for increased sidewall coverage even in high-density plasma chambers by adjusting the RF power during the deposition process.

Career Highlights

Ying Yin Hui is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has positioned him as a key player in advancing sputtering technologies. With a focus on innovation, he continues to contribute to the development of cutting-edge solutions in material deposition.

Collaborations

Ying Yin Hui has collaborated with notable colleagues such as Kenny King-Tai Ngan and Seshadri Ramaswami. These collaborations have fostered a creative environment that encourages the exchange of ideas and the pursuit of technological advancements.

Conclusion

Ying Yin Hui's contributions to sputtering technology exemplify the impact of innovative thinking in the field of material deposition. His patented methods not only improve sidewall coverage but also enhance the overall efficiency of the sputtering process. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.

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