Taichung, Taiwan

Ying-Hung Chen

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.3

ph-index = 1


Company Filing History:


Years Active: 2024

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3 patents (USPTO):Explore Patents

Title: Innovations of Ying-Hung Chen: Pioneering Patents in Plasma Technology and Conductive Materials

Introduction: Ying-Hung Chen is a notable inventor based in Taichung, Taiwan, known for his significant contributions to technology through his innovative patents. With a focus on advancements in plasma aerosol devices and transparent conductive films, Chen has accumulated three patents that showcase his expertise and creativity.

Latest Patents: One of Ying-Hung Chen's latest patents is the Plasma Aerosol Device. This invention features a gas tunnel, a dielectric barrier discharge module, and a liquid tunnel. Utilizing a mechanism akin to a dielectric barrier discharge (DBD) electrode system, this device generates a plasma active water mist rich in free radicals such as reactive nitrogen species (RNS) and reactive oxygen species (ROS). The implications of this invention are vast, offering applications in medical, sterilization, agriculture, and preservation industries.

Another notable patent by Chen is for a Flexible Transparent Conductive Composite Film and its manufacturing method. This invention involves depositing a first target material and a second target material in an alternating manner using High-Power Impulse Magnetron Sputtering (HiPIMS). The innovation allows for the omission of the post-anneal step found in traditional methods, thereby significantly improving the manufacturing efficiency of flexible transparent conductive composite films.

Career Highlights: Ying-Hung Chen works at Feng Chia University, where he continues to drive innovative research and development in materials science and engineering. His work reflects a commitment to advancing technology and providing practical applications for modern industries.

Collaborations: Throughout his career, Chen has collaborated with prominent colleagues, including Ping-Yen Hsieh and Chu-Liang Ho. These collaborations contribute to a vibrant research environment that fosters creativity and the sharing of ideas among passionate inventors and engineers.

Conclusion: Ying-Hung Chen exemplifies the spirit of innovation with his remarkable patents in plasma technology and conductive materials. As he continues to push the boundaries of technology at Feng Chia University, his work promises to bring significant advancements that could transform industries and improve various applications.

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