Yeong Rvey Shiue

Title: Yeong Rvey Shiue: Innovator in Wafer Cooling Technology

Introduction

Yeong Rvey Shiue is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of wafer cooling processes. His innovative approach has the potential to enhance production efficiency and reduce costs in the industry.

Latest Patents

Yeong Rvey Shiue holds a patent for a method of in-situ wafer cooling for a sequential WSi/α-Si sputtering process. This invention relates to a method that improves the sputtering process of tungsten silicide (WSi) and α-silicon (α-Si) by cooling the wafer using inert gas before the α-Si sputtering begins. This technique not only saves time by reducing the vacuuming and venting processes but also minimizes the risk of wafer contamination and lowers fabrication costs.

Career Highlights

Yeong Rvey Shiue is currently employed at Mosel Vitelic Corporation, where he continues to work on advancements in semiconductor technology. His expertise in sputtering processes has positioned him as a valuable asset to his team and the company.

Collaborations

Some of his notable coworkers include Hsien-Liang Meng and Elvis Huang. Their collaborative efforts contribute to the innovative environment at Mosel Vitelic Corporation.

Conclusion

Yeong Rvey Shiue's contributions to wafer cooling technology exemplify the impact of innovation in the semiconductor industry. His patent reflects a commitment to improving manufacturing processes and reducing costs, showcasing the importance of inventors in driving technological advancements.