Yearin Byun

Title: Yearin Byun: Innovator in Chemical Mechanical Polishing

Introduction

Yearin Byun is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor device fabrication. His innovative work focuses on improving the efficiency and effectiveness of chemical mechanical polishing methods.

Latest Patents

Yearin Byun holds a patent for a "Chemical mechanical polishing method and method for fabricating semiconductor device using the same." This patent describes a chemical mechanical polishing method that involves polishing a polishing object at a first temperature using a specialized slurry. The method also includes removing the slurry at a second temperature, which is different from the first. The slurry consists of abrasive particles, a thermoresponsive inhibitor, and deionized water. The thermoresponsive inhibitor features a polymer that undergoes a phase transition between the two temperatures, allowing for enhanced polishing performance.

Career Highlights

Yearin Byun is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Yearin Byun collaborates with In Kwon Kim, who is also involved in the semiconductor field. Their partnership enhances the research and development efforts at Samsung Electronics.

Conclusion

Yearin Byun's contributions to chemical mechanical polishing methods represent a significant advancement in semiconductor device fabrication. His innovative approach and collaboration with industry professionals continue to drive progress in this critical area of technology.