Company Filing History:
Years Active: 2023-2025
Title: YeaHyun Gu: Innovator in Substrate Processing Technologies
Introduction
YeaHyun Gu is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of five patents. His innovative approaches have advanced the methods used in forming patterned features on substrates, which are crucial in various technological applications.
Latest Patents
YeaHyun Gu's latest patents include a "Method and system for forming patterned features on a surface of a substrate using a plasma-enhanced cyclical deposition process." This patent discloses exemplary methods that utilize a plasma-enhanced cyclical deposition process to create a transformable layer comprising a first material. The transformable layer is then exposed to energy to form a second material, allowing for selective etching between the two materials. Another notable patent is the "Method for processing a substrate," which provides a technique to adjust film stress. In this method, a first film is formed on the substrate by sequentially supplying a first and second reactant. The first film is then converted into a second film by introducing a third reactant, with the film stress of the second film being adjustable through controlled ratios of the steps involved.
Career Highlights
YeaHyun Gu is currently employed at ASM IP Holding B.V., where he continues to develop innovative solutions in substrate processing. His work has been instrumental in enhancing the efficiency and effectiveness of various manufacturing processes.
Collaborations
YeaHyun Gu collaborates with talented individuals in his field, including coworkers Hyunchul Kim and SeungWoo Choi. Their combined expertise contributes to the advancement of technologies related to substrate processing.
Conclusion
YeaHyun Gu is a notable inventor whose work in substrate processing has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to pushing the boundaries of technology.