Yasutaka Kohno, Deceased

Title: Yasutaka Kohno: Innovating Semiconductor Technology

Introduction

Yasutaka Kohno was a prominent inventor from Saijyo, Japan, known for his contributions to semiconductor technology. With a portfolio of five patents, Kohno focused primarily on methods for fabricating field effect transistors, significantly advancing the efficiency and reliability of semiconductor devices. His work has left a lasting impact on the field, even long after his passing.

Latest Patents

Kohno's latest innovations include the "Method of Making Field Effect Transistor" and the "Method of Fabricating Semiconductor Device." The fabrication method for field effect transistors detailed an intricate process that includes forming an active layer, creating a recess to enhance gate length precision, and using side walls as masks to ensure no variation in channel current due to thickness discrepancies. His work on semiconductor devices involved implanting dopant ions to create a channel region and improve device reliability, breakdown voltage, and transconductance.

Career Highlights

During his career, Kohno worked with Mitsubishi Denki Kabushiki Kaisha, a leader in innovative electronic solutions. His contributions played a crucial role in pushing boundaries within the semiconductor industry, establishing methodologies that are still relevant today.

Collaborations

Kohno collaborated with other notable engineers, including Tomoki Oku and Shinichi Miyakuni. Their combined expertise fostered a creative environment that propelled advancements in semiconductor technology, leading to the successful development of several innovative products.

Conclusion

Yasutaka Kohno’s legacy as an inventor is marked by significant advancements in semiconductor fabrication techniques. His work not only contributed to specific technologies but also inspired further research and development in the field, solidifying his status as an influential figure in the realm of semiconductor innovations.