Yokohama, Japan

Yasunobu Ikeda



Average Co-Inventor Count = 3.8

ph-index = 5

Forward Citations = 82(Granted Patents)


Location History:

  • Yokohama, JP (2003 - 2006)
  • Tokyo, JP (1997 - 2009)

Company Filing History:


Years Active: 1997-2009

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8 patents (USPTO):Explore Patents

Title: Yasunobu Ikeda: Innovator in SOI Wafer Technology

Introduction

Yasunobu Ikeda is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of bonded Silicon-On-Insulator (SOI) wafers. With a total of 8 patents to his name, Ikeda's work has had a lasting impact on the industry.

Latest Patents

Ikeda's latest patents include a method for manufacturing bonded SOI wafers and the bonded SOI wafers produced by this method. The innovative process involves bonding in the presence of organics on the surfaces of both the active layer wafer and the supporting wafer. This technique allows for the formation of crystal defects at the interfaces, which can effectively remove heavy-metal impurities that negatively affect device characteristics. Additionally, he has developed a portable electronic equipment and battery mounting device that enables a single motion to lock and unlock both the back lid and battery of mobile electronic apparatuses.

Career Highlights

Throughout his career, Yasunobu Ikeda has worked with notable companies such as Matsushita Electric Industrial Co., Ltd. and Sumco Corporation. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and innovation.

Collaborations

Ikeda has collaborated with esteemed colleagues, including Toshihiro Higuchi and Yoji Inomata. These partnerships have fostered a creative environment that has led to groundbreaking advancements in technology.

Conclusion

Yasunobu Ikeda's contributions to the field of semiconductor technology, particularly through his patented methods for bonded SOI wafers, demonstrate his innovative spirit and commitment to improving device characteristics. His work continues to influence the industry and inspire future advancements.

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