Company Filing History:
Years Active: 1996-1997
Title: Yasumasa Toba: Innovator in Photosensitive Materials
Introduction
Yasumasa Toba is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of 3 patents. His work focuses on developing innovative materials that enhance the efficiency and stability of photopolymerization processes.
Latest Patents
Toba's latest patents include advancements in photosensitive recording materials and mediums. One notable patent describes a photosensitive recording material that comprises a solvent-soluble, thermosetting epoxy oligomer capable of cationic polymerization. This material includes an aliphatic monomer with at least one ethylenically unsaturated bond, which is liquid at normal temperature and pressure. The monomer has a boiling point of 100°C or above and is capable of radical polymerization. The patent also details a photoinitiator that generates both radical species and Brønsted or Lewis acids upon exposure to actinic radiation. This innovative material is effective for producing volume type phase holograms with superior diffraction efficiency, transparency, and weatherability.
Another patent focuses on a photopolymerization initiator composition that is almost free from deactivation. This composition allows for a photopolymerizable mixture that maintains a high curing rate even in high-viscosity media, showcasing Toba's commitment to advancing photopolymerization technology.
Career Highlights
Throughout his career, Yasumasa Toba has worked with notable companies such as Toyo Ink Manufacturing Company and Toppan Printing Co., Ltd. His experience in these organizations has allowed him to refine his expertise in the development of photosensitive materials and their applications.
Collaborations
Toba has collaborated with esteemed colleagues, including Madoka Yasuike and Yamaguchi Takeo. These partnerships have contributed to the innovative advancements in his field, fostering a collaborative environment for research and development.
Conclusion
Yasumasa Toba's contributions to the field of photosensitive materials have established him as a key innovator in the industry. His patents reflect a deep understanding of photopolymerization processes and a commitment to enhancing material performance. His work continues to influence advancements in technology and materials science.