Mountain View, CA, United States of America

Yao-Cheng Yang


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yao-Cheng Yang: Innovator in Digital Lithography

Introduction

Yao-Cheng Yang is a notable inventor based in Mountain View, CA. He has made significant contributions to the field of digital lithography, particularly through his innovative patent. His work focuses on optimizing digital pattern files, which are crucial for the efficiency of lithography devices.

Latest Patents

Yao-Cheng Yang holds a patent for the "Optimization of a digital pattern file for a digital lithography device." This patent describes a digital pattern generation system that includes a memory and a controller. The controller is designed to remove redundant cells from a digital pattern file, generate a first updated digital pattern file, and compare it with the original digital pattern file. The process further involves reducing the number of vertexes of a first arc in the updated file to create a second updated digital pattern file. Additionally, the first cell of this second file is replaced with an alternative version to generate a third updated digital pattern file. Finally, one or more polygons within this third file are converted into quad polygons, resulting in an optimized digital pattern file.

Career Highlights

Yao-Cheng Yang is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in digital lithography technology.

Collaborations

Throughout his career, Yao-Cheng has collaborated with several talented individuals, including Chung-Shin Kang and Thomas L Laidig. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Yao-Cheng Yang is a prominent figure in the realm of digital lithography, with a patent that showcases his innovative approach to optimizing digital pattern files. His contributions to Applied Materials, Inc. and collaborations with other professionals highlight his commitment to advancing technology in this field.

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