Company Filing History:
Years Active: 2024
Title: Yanhui Wang: Innovator in Diamond Polishing Techniques
Introduction
Yanhui Wang is a prominent inventor based in Fujian, China. He has made significant contributions to the field of materials science, particularly in the polishing and grinding of single-crystal diamonds. With a total of two patents to his name, Wang's work has the potential to enhance the efficiency and effectiveness of diamond processing.
Latest Patents
Wang's latest patents include a method for polishing single-crystal diamond and a method for grinding single-crystal diamond. The polishing method involves forming an amorphous carbon layer due to lattice distortion of carbon atoms on the surface layer of a single-crystal diamond. This process utilizes a mechanical shear function of a hard abrasive, generating a chemical reaction between the amorphous carbon layer and the reactive abrasive. This innovative approach allows for the rapid removal of carbon atoms from the diamond's surface due to the local high temperature created by friction at high speeds. The grinding method employs carbon atoms of a single-crystal diamond and active abrasives to produce a chemical reaction that forms carbides under specific grinding conditions, ensuring that the temperature does not exceed the graphitization threshold. A hard abrasive is then used to effectively remove these carbides.
Career Highlights
Yanhui Wang is affiliated with Huaqiao University, where he continues to advance his research and development in diamond processing techniques. His work not only