Yahui Huang

Title: Yahui Huang - Innovator in Radiofrequency Source Control

Introduction

Yahui Huang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of microelectronics, particularly in the control of radiofrequency sources. With a total of 2 patents, his work has advanced the technology used in plasma processing.

Latest Patents

Yahui Huang's latest patents include a control method of a radiofrequency source and a lower electrode mechanism with a reaction chamber. The control method provides a novel approach to managing RF sources, which includes a main power supply and a secondary power supply operating at the same frequency. This method divides the process steps of plasma processing into multiple time periods, ensuring that the common exciter phase locking delay angle is maintained at a predetermined value. This innovation enhances the angular distribution uniformity of plasma, ultimately improving the process uniformity of the workpiece being processed.

The lower electrode mechanism and reaction chamber patent describe a design that includes a base for carrying the workpiece and a lower electrode chamber. This chamber features both electromagnetic shielding and non-electromagnetic shielding spaces, which are isolated from each other. The design prevents interference between components located in these two spaces, thereby enhancing the efficiency of the processing environment.

Career Highlights

Yahui Huang is currently employed at Beijing Naura Microelectronics Equipment Co., Ltd. His work at this company has positioned him as a key player in the development of advanced microelectronic equipment. His innovative approaches have contributed to the company's reputation for excellence in the industry.

Collaborations

Yahui Huang collaborates with talented individuals such as Gang Wei and Jing Jing Wei. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Yahui Huang's contributions to the field of microelectronics, particularly through his patents on radiofrequency source control, demonstrate his commitment to advancing technology. His work not only enhances the efficiency of plasma processing but also sets a foundation for future innovations in the industry.