Company Filing History:
2 out of 832,880 Years Active: 2004-2006
Title: Xuemei Wang: Innovator in Semiconductor Technology
Introduction
Xuemei Wang is a prominent inventor based in Houston, Texas. She has made significant contributions to the field of semiconductor technology, holding two patents that showcase her innovative approach to enhancing semiconductor performance.
Latest Patents
Her latest patents include a method for shallow dopant distribution, where vacancies and dopant ions are introduced near the surface of a semiconductor wafer. This technique allows for dopant ions to diffuse by an interstitialcy mechanism, resulting in greatly reduced diffusivity. Consequently, this leads to a very low resistivity doped region and a very shallow junction. Another notable patent is for a semiconductor wafer with an ultra-thin doping level formed by defect engineering, which employs similar principles to achieve optimal performance.
Career Highlights
Xuemei Wang's career is marked by her dedication to advancing semiconductor technology. Her innovative methods have the potential to revolutionize the industry by improving the efficiency and effectiveness of semiconductor devices.
Collaborations
She has collaborated with esteemed colleagues such as Wei-Kan Chu and Lin Shao, contributing to a dynamic research environment that fosters innovation and discovery.
Conclusion
Xuemei Wang's work in semiconductor technology exemplifies the impact of innovative thinking in engineering. Her patents reflect a commitment to pushing the boundaries of what is possible in the field.