Xu Li

Title: Xu Li: Innovator in Semiconductor Cleaning Solutions

Introduction

Xu Li is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of cleaning solutions for semiconductor substrates.

Latest Patents

Xu Li holds 3 patents that focus on innovative cleaning solutions for semiconductor substrates after the polishing of copper films. His latest patents include a cleaning solution, method, and apparatus designed to effectively clean semiconductor substrates post-chemical mechanical polishing of copper layers. The first patent describes a cleaning solution that combines deionized water, an organic compound, and an ammonium compound in an acidic pH environment. This solution addresses issues related to brush loading and contamination on semiconductor surfaces. The second patent outlines a cleaning solution formed by mixing citric acid and ammonia in deionized water, achieving a pH of about 4. This method is particularly effective for cleaning polished copper layers in semiconductor substrates.

Career Highlights

Xu Li is currently employed at Lam Research Corporation, where he continues to innovate in the semiconductor industry. His work has been instrumental in enhancing the cleaning processes that are critical for maintaining the integrity of semiconductor devices.

Collaborations

Some of Xu Li's notable coworkers include Yuexing Zhao and Diane J Hymes, who have collaborated with him on various projects within the semiconductor field.

Conclusion

Xu Li's contributions to semiconductor cleaning solutions demonstrate his commitment to advancing technology in this critical area. His innovative patents reflect a deep understanding of the challenges faced in semiconductor manufacturing and offer effective solutions to enhance product quality.