Company Filing History:
Years Active: 2022-2025
Title: Innovations of Xinran Wang in Transition Metal Dichalcogenides
Introduction
Xinran Wang is a prominent inventor based in Nanjing, China. He has made significant contributions to the field of materials science, particularly in the development of transition metal dichalcogenides (TMDCs). With a total of 2 patents, his work focuses on methods for producing high-quality TMDC films.
Latest Patents
Wang's latest patents include a method for the uniform growth of bi-layer transition metal dichalcogenide continuous films. This innovative approach allows for the growth of large-area, uniform, and continuous films of bi-layer TMDCs on a substrate. The method ensures that the top and bottom layers of the bi-layer domains grow synchronously, which guarantees the uniformity of the films. The bi-layer TMDCs films include materials such as molybdenum disulfide and tungsten diselenide, achieving centimeter-level sizes limited only by the substrate dimensions.
Another notable patent is the method for preparing large-area transition metal dichalcogenide single-crystal films. This method involves vapor deposition on a single-crystal c-plane sapphire substrate, resulting in unidirectionally arranged TMDC domains that merge into a large-area single-crystal film. The lateral size of the films can reach inch levels or more, showcasing the potential for large-scale applications.
Career Highlights
Xinran Wang is affiliated with Nanjing University, where he conducts research and development in advanced materials. His work has garnered attention in the scientific community, contributing to the advancement of TMDC technologies.
Collaborations
Wang collaborates with notable colleagues, including Taotao Li and Yi Shi, who contribute to his research endeavors. Their combined expertise enhances the innovative potential of their projects.
Conclusion
Xinran Wang's contributions to the field of transition metal dichalcogenides are noteworthy, with innovative methods that push the boundaries of material science. His patents reflect a commitment to advancing technology and fostering collaboration in research.