Xinping Hu

Title: Innovations of Xinping Hu in Mass Analyzing Technology.

Introduction

Xinping Hu is a notable inventor based in Chengdu, China. He has made significant contributions to the field of mass analyzing technology, particularly in the ion implantation industry. His innovative approach has led to the development of advanced systems that enhance the quality and efficiency of ion implantation processes.

Latest Patents

Xinping Hu holds a patent for a "High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter." This invention provides a mass analyzing magnet capable of bending wide charged particle ribbon beams through angles between 90 to 200 degrees. The design aligns the shorter dimension of the ribbon beam with the magnetic field, allowing for effective mass or momentum analysis. The magnet's unique pole shape increases mass resolving power while minimizing system aberrations, making it particularly valuable in the ion implantation industry. The ribbon beam widths can reach up to 1000 mm, enabling the construction of ion implanter systems that deliver mass-analyzed ribbon beams for various applications.

Career Highlights

Throughout his career, Xinping Hu has focused on developing technologies that improve the performance of ion implanters. His work has been instrumental in advancing the capabilities of mass analyzing magnets, leading to lower costs and better ribbon beam quality compared to conventional systems.

Collaborations

Xinping Hu has collaborated with various professionals in his field, including his coworker Yongzhang Huang. Their joint efforts have contributed to the successful development and implementation of innovative technologies in mass analysis.

Conclusion

Xinping Hu's contributions to mass analyzing technology have positioned him as a key figure in the ion implantation industry. His innovative patent demonstrates a commitment to enhancing the efficiency and quality of ion implanter systems.