Xingjie Fang

Title: **The Innovations of Xingjie Fang: Pioneering Enhanced Cathodic ARC Source Technology**

Introduction

Xingjie Fang is an inventive mind based in Great Neck, NY, who has significantly contributed to the field of plasma deposition technology. With one patent to his name, he has developed an innovative method that improves the hardness, density, and transparency of diamond-like carbon (DLC) films. His work showcases the intersection of creativity and technical expertise in advancing material deposition techniques.

Latest Patents

Xingjie Fang holds a patent for his invention titled "Enhanced Cathodic ARC Source for ARC Plasma Deposition." This groundbreaking technology revolves around an improved cathodic arc source and a meticulous method of depositing DLC films. The technique utilizes a carbon-containing directional-jet plasma flow generated within a cylindrical graphite cavity. This cavity's depth is designed to be approximately equal to the cathode diameter, allowing the carbon plasma to expand effectively into ambient vacuum conditions.

The invention comprises a repetitive process that includes two main steps: the plasma generation and deposition step, followed by a recovery step. During the recovery phase, an excessive amount of carbon that accumulates on the cavity wall is periodically removed. This is accomplished through the motion of the cathode rod, which extends above the orifice and returns to its initial position, ensuring that the film is deposited with the desired thickness. The technical advantages of this invention include enhanced film properties, high reproducibility, extended operational duration, and reduced particulate contamination.

Career Highlights

Xingjie Fang is a key contributor at Veeco Instruments Inc., where he leverages his expertise to push the boundaries of material science. His ability to innovate within the complex field of plasma deposition has been instrumental in advancing the quality and efficiency of thin films used in various applications. Fang's patent not only reflects his technical capabilities but also highlights his commitment to solving practical challenges faced by the industry.

Collaborations

Throughout his career, Xingjie Fang has worked alongside esteemed colleagues such as Boris L. Druz and Viktor Kanarov. Their collaboration has fostered an environment of innovation and shared expertise, furthering advancements in arc plasma technology. Together, these professionals contribute to Veeco Instruments Inc.'s mission to deliver cutting-edge solutions to the market.

Conclusion

Xingjie Fang's contributions to the field of plasma deposition are noteworthy, especially in the development of his patented enhanced cathodic ARC source technology. His innovative approach addresses key technical challenges and sets a new standard for DLC film deposition. As he continues his work at Veeco Instruments Inc., Fang embodies the spirit of innovation that drives the evolution of material science and engineering.