Xiaolan Chen

Title: Innovations of Xiaolan Chen in Lithography Techniques

Introduction

Xiaolan Chen is a prominent inventor based in Albuquerque, NM (US). She has made significant contributions to the field of lithography, particularly in the development of methods and apparatuses for the exposure of sparse arrays of sub-micrometer structures. Her innovative work has implications for various applications in microfabrication and nanotechnology.

Latest Patents

Xiaolan Chen holds a patent titled "Methods and apparatus for lithography of sparse arrays of sub-micrometer." This patent discloses various methods for exposing sparse hole and/or mesa arrays with line:space ratios of 1:3 or greater, as well as sub-micrometer hole and/or mesa diameters in a layer of photosensitive material. The methods include double exposure interferometric lithography pairs, additional processing steps for transferring arrays, and combinations of optical lithography exposures. The apparatuses disclosed in her patent include arrangements for three-beam, five-beam, and four-beam interferometric exposures.

Career Highlights

Xiaolan Chen is affiliated with the University of New Mexico, where she continues to advance her research in lithography techniques. Her work has garnered attention for its innovative approaches to microfabrication, contributing to the development of more efficient and precise lithographic processes.

Collaborations

Xiaolan has collaborated with notable colleagues, including Steven Roy Julien Brueck and Saleem H Zaidi. These collaborations have further enriched her research and expanded the impact of her innovations in the field.

Conclusion

Xiaolan Chen's contributions to lithography represent a significant advancement in the field of microfabrication. Her innovative methods and apparatuses are paving the way for future developments in nanotechnology and related applications.