Xiao Liang Jin

Title: **Innovator Spotlight: Xiao Liang Jin**

Introduction:

Xiao Liang Jin is a distinguished inventor based in Sunnyvale, California, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of five patents, Jin's work exemplifies innovation and practical application in advanced materials and processes, particularly in the realm of chemical vapor deposition.

Latest Patents:

Xiao Liang Jin's latest patents demonstrate his expertise and ingenuity. One notable invention is the **Temperature Controlled Gas Feedthrough**, which pertains to an apparatus and process for vaporizing liquid precursors and depositing films on substrates. This invention provides a solution for controlling gas flow through a feedthrough in a substrate processing chamber and ensures the maintenance of elevated temperatures to prevent unwanted condensation.

Another significant patent is the **High Temperature, High Flow Rate Chemical Vapor Deposition Apparatus and Related Methods**. This innovative system enables the deposition of titanium films at rates of up to 200 Å/minute from a titanium tetrachloride source. The design incorporates a ceramic heater assembly with an integrated RF plane, allowing for more efficient plasma treatment at temperatures of at least 400 °C. The system also includes features that minimize deposition on chamber components and reduce the frequency of cleanings, thus enhancing operational efficiency.

Career Highlights:

Xiao Liang Jin currently contributes his expertise at Applied Materials, Inc., a leader in the semiconductor industry. His work at this prestigious company has positioned him as a key player in the development of advanced deposition technologies that have far-reaching implications for semiconductor fabrication.

Collaborations:

Throughout his career, Jin has collaborated with other notable professionals in the field, including Jun Zhao and Lee Luo. These partnerships have fostered innovation and contributed to the successful implementation of his patented technologies in the industry.

Conclusion:

Xiao Liang Jin's contributions through his innovative patents highlight his valuable role in the semiconductor landscape. As a driven inventor, his advancements in vapor deposition technologies continue to shape the future of material science and semiconductor manufacturing. With each patent, Jin not only showcases his technical expertise but also enhances the capabilities of the industry, ensuring a brighter and more efficient technological future.