Xianhua Xu

Title: Xianhua Xu: Innovator in Exposure and Development Technologies

Introduction

Xianhua Xu is a prominent inventor based in Beijing, China. He has made significant contributions to the field of exposure and development technologies. His innovative work has led to the creation of a patent that addresses critical challenges in substrate processing.

Latest Patents

Xianhua Xu holds a patent titled "Method for exposure and development, system for controlling exposure and system for exposure and development." This patent provides a method designed to expose and develop a substrate that is larger than the mask used in the process. The method involves exposing and developing various regions of the substrate, which are pieced together to form a complete area that requires exposure and development.

Career Highlights

Throughout his career, Xianhua Xu has worked with notable companies in the technology sector. He has been associated with BOE Technology Group Co., Ltd. and Hefei BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in optoelectronic technologies.

Collaborations

Xianhua Xu has collaborated with several professionals in his field, including Xuequan Yu and Zhi Peng Liu. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Xianhua Xu is a distinguished inventor whose work in exposure and development technologies has made a significant impact in the industry. His patent and collaborations reflect his commitment to advancing technology and innovation.