Company Filing History:
Years Active: 2000-2001
Title: Wun-Ku Wang: Innovator in Polymer Thick Film Resistors
Introduction
Wun-Ku Wang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of electronics, particularly in the development of polymer thick film resistors. With a total of 2 patents, his work has advanced the technology used in printed circuit substrates.
Latest Patents
Wang's latest patents include a process for forming polymer thick film resistors and metal thin film resistors on a printed circuit substrate. This innovative process involves applying a photoresist layer onto the substrate and forming openings to expose specific regions for resistors. This method allows for the application of polymer thick resist pastes and resistive metallic films with precise geometry, offering higher accuracy and greater processing flexibility compared to traditional screen printing methods. Additionally, he has developed polymer thick film resistor pastes that exhibit dimensional stability and excellent processability, including coating, printing, and extruding.
Career Highlights
Wun-Ku Wang is affiliated with the Industrial Technology Research Institute, where he continues to push the boundaries of technology in his field. His work has been instrumental in enhancing the performance and reliability of electronic components.
Collaborations
Wang has collaborated with notable colleagues such as Chia-Tin Chung and Bin-Yuan Lin, contributing to various projects that aim to innovate and improve electronic materials and processes.
Conclusion
Wun-Ku Wang's contributions to the field of polymer thick film resistors highlight his role as a key innovator in electronics. His patents and ongoing work at the Industrial Technology Research Institute continue to influence the industry positively.