Wulf B Kunkel

Title: Wulf B Kunkel: Innovator in Ion Beam Technology

Introduction

Wulf B Kunkel is a notable inventor based in Berkeley, CA, recognized for his contributions to ion beam technology. He holds 2 patents that focus on the production and neutralization of ion beams, which are crucial in various applications, including semiconductor manufacturing.

Latest Patents

Kunkel's latest patents include a method for the production of N⁺ ions from a multicusp ion beam apparatus. This innovative method generates a high purity N⁺ ion beam using a multicusp ion source, which features a chamber formed by a cylindrical wall surrounded by magnets. The process involves ionizing nitrogen gas in the arc discharge region and maintaining optimal conditions to ensure a high percentage of N⁺ ions in the extracted ion beams. Another significant patent is for a charge neutralization apparatus for ion implantation systems. This apparatus includes an electron source and a magnetic assembly designed to guide the electron beam to the workpiece, effectively neutralizing charge buildup on semiconductor wafers.

Career Highlights

Throughout his career, Kunkel has worked with prominent organizations, including Varian Associates, Inc. and the United States of America as represented by the United States. His work has significantly advanced the field of ion beam technology, making him a respected figure in the industry.

Collaborations

Kunkel has collaborated with notable professionals such as Ka-Ngo Leung and Malcom D Williams, contributing to the development of innovative technologies in his field.

Conclusion

Wulf B Kunkel's contributions to ion beam technology through his patents and collaborations have made a lasting impact on the industry. His work continues to influence advancements in semiconductor manufacturing and related fields.