Location History:
- Monmouth Junction, NJ (US) (1980)
- Middlesex, NJ (US) (1981)
Company Filing History:
Years Active: 1980-1981
Title: The Innovations of Wolfram A Bosenberg
Introduction
Wolfram A Bosenberg is a notable inventor based in Monmouth Junction, NJ (US). He has made significant contributions to the field of optical testing and photoresist technology. With a total of 4 patents to his name, Bosenberg's work has had a considerable impact on the development of integrated circuits.
Latest Patents
Bosenberg's latest patents include a method for optically testing the lateral dimensions of a pattern. This innovative method involves applying material to both the main area and a test area of a substrate, followed by the simultaneous removal of the material to create a pattern and a diffraction grating. The diffraction grating is then exposed to a beam of light, allowing for the measurement of the intensity of two diffracted beams to determine the lateral dimensional tolerance of the integrated circuit pattern. Another significant patent is a method of defining a photoresist layer, which entails vibrating the wafer during exposure to eliminate standing waves. This process helps to ensure uniform exposure across the photoresist layer.
Career Highlights
Bosenberg is currently associated with RCA Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of optical testing and photoresist applications in the semiconductor industry.
Collaborations
One of his notable coworkers is Hans P Kleinknecht, with whom he has collaborated on various projects. Their combined expertise has contributed to the success of their innovations.
Conclusion
Wolfram A Bosenberg's contributions to the field of optical testing and photoresist technology highlight his role as a leading inventor. His patents reflect a commitment to advancing technology in the semiconductor industry.