Schwaikheim, Germany

Wolfgang Otto Rauscher


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 1999-2001

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2 patents (USPTO):Explore Patents

Title: **Innovations of Wolfgang Otto Rauscher**

Introduction

Wolfgang Otto Rauscher, an inventive mind residing in Schwaikheim, Germany, has made significant contributions to the field of material science through his patents. With a total of two patents to his name, he showcases a blend of creativity and technical expertise that enriches the development of advanced materials.

Latest Patents

Rauscher's latest innovations focus on methods for controlling stress in films. One of his prominent inventions details a method for providing a predetermined level and state of stress in a film deposited on a substrate surface. In this technique, a layer of crystalline material is deposited on the substrate, followed by a layer of amorphous material. The subsequent heating process induces crystallization in the amorphous layer, effectively reducing or modifying the state of stress. This alteration has the potential to influence the forces applied by the film to adjacent substrate regions, making it particularly relevant for deep-trench capacitors utilized in trench-storage DRAMs.

Career Highlights

Wolfgang Otto Rauscher is currently employed at the International Business Machines Corporation (IBM), where he applies his innovative approaches in ongoing research and development. His work not only impacts the company but also contributes broadly to advancements in technology and materials engineering.

Collaborations

Throughout his career, Rauscher has collaborated with esteemed colleagues such as Donald W Brouillette and Timothy Charles Krywanczyk. These collaborations further demonstrate the importance of teamwork in driving innovation and pushing the boundaries of technology.

Conclusion

In summary, Wolfgang Otto Rauscher stands out as a dedicated inventor whose work in controlling stress within films is poised to facilitate advancements in semiconductor technology. His contributions at IBM reflect a commitment to innovation, laying the groundwork for future discoveries and applications in the material science field.

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