San Jose, CA, United States of America

Wojciech Walecki

This inventor holds 2 USPTO granted patents. Top assignees: Ahbee 1, L.p., Other. Active years: 2006-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wojciech Walecki. Retrieved from https://idiyas.com/inventor/wojciech-walecki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2006-2009

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2 patents (USPTO):Explore Patents

Title: Wojciech Walecki: Innovator in Optical Metrology

Introduction

Wojciech Walecki is a notable inventor based in San Jose, California. He has made significant contributions to the field of optical metrology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Walecki's latest patents include a device for measuring absolute distances using low coherence optical interferometry. This invention addresses the thermal issues commonly faced by conventional fiber optic interferometers, which are affected by temperature variations that alter the refractive index of the optical fiber material. His second patent involves a method and apparatus for determining the thickness of slabs of materials using an interferometer, further demonstrating his commitment to advancing measurement technologies.

Career Highlights

Throughout his career, Walecki has worked with various companies, including Ahbee 1, L.P. His work has significantly impacted the development of optical measurement techniques, making him a respected figure in his field.

Collaborations

Walecki has collaborated with Phuc Van, contributing to the advancement of optical metrology through shared knowledge and expertise.

Conclusion

Wojciech Walecki's innovative contributions to optical metrology highlight his role as a leading inventor in the field. His patents reflect a dedication to solving complex measurement challenges, making a lasting impact on technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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