San Antonio, TX, United States of America

Wing Kei Au


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2002

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Wing Kei Au in Semiconductor Technology

Introduction

Wing Kei Au is an accomplished inventor based in San Antonio, TX (US). She has made significant contributions to the field of semiconductor technology, particularly in the area of preventing electrochemical erosion in interconnect structures. Her innovative approach has led to the development of a patented method that enhances the reliability of semiconductor devices.

Latest Patents

Wing Kei Au holds a patent for a "System and method for preventing electrochemical erosion by depositing a protective film." This patent describes a method for creating reliable interconnect structures on a semiconductor substrate with a first dielectric layer. The process involves several steps, including the deposition of a TiN glue layer, tungsten chemical vapor deposition, and subsequent copper deposition. The method effectively minimizes copper diffusion and enhances the durability of semiconductor devices.

Career Highlights

Wing Kei Au is currently employed at Koninklijke Philips Corporation N.V., where she continues to innovate in semiconductor technology. Her work focuses on developing methods that improve the performance and reliability of electronic components. With her expertise, she has contributed to advancements that are crucial for the semiconductor industry.

Collaborations

Wing Kei Au collaborates with her coworker, Albert H Liu, to further enhance their research and development efforts. Together, they work on innovative solutions that address challenges in semiconductor manufacturing.

Conclusion

Wing Kei Au's contributions to semiconductor technology through her patented methods demonstrate her commitment to innovation and excellence in the field. Her work not only advances technology but also sets a standard for future developments in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…