Company Filing History:
Years Active: 1995
Title: Winfried Meier: Innovator in Radiation-Sensitive Mixtures
Introduction
Winfried Meier is a notable inventor based in Frankfurt am Main, Germany. He has made significant contributions to the field of radiation-sensitive materials, holding a total of 2 patents. His work has implications in various technological applications, particularly in the realm of photolithography.
Latest Patents
Meier's latest patents include a negative-working radiation-sensitive mixture containing diazomethane. This innovative mixture is designed to enhance the performance of radiation-sensitive applications. Another patent focuses on a negative-working radiation-sensitive mixture that comprises a unique formulation aimed at improving sensitivity and efficiency in various processes.
Career Highlights
Winfried Meier has had a distinguished career, working with Hoechst Aktiengesellschaft, a prominent company in the chemical and pharmaceutical industry. His expertise in developing radiation-sensitive materials has positioned him as a key figure in his field.
Collaborations
Throughout his career, Meier has collaborated with notable colleagues, including Georg Pawlowski and Ralph R. Dammel. These partnerships have fostered innovation and contributed to the advancement of technology in their shared areas of expertise.
Conclusion
Winfried Meier's contributions to the field of radiation-sensitive mixtures highlight his role as an influential inventor. His patents and collaborations reflect a commitment to innovation and excellence in technology.