William Pryor

Title: Innovations of William Pryor in Chamber Cleaning Technology

Introduction

William Pryor is an accomplished inventor based in Georgetown, TX (US). He has made significant contributions to the field of processing chamber cleaning technology. His innovative approach has led to the development of a unique method for determining cleaning endpoints in processing chambers.

Latest Patents

William Pryor holds a patent for a "Virtual sensor for chamber cleaning endpoint." This invention relates to methods for cleaning processing chambers, specifically focusing on determining cleaning endpoints. The virtual sensor operates by monitoring trends in chamber foreline pressure during the cleaning process. It converts solid deposited films on chamber parts into gaseous byproducts through reactions with etchants, such as fluorine plasma. The validity of this virtual sensor has been confirmed by comparing its response with infrared-based optical measurements.

Career Highlights

William Pryor is currently employed at Applied Materials, Inc., where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and effectiveness of chamber cleaning processes.

Collaborations

William has collaborated with notable coworkers, including Hemant P Mungekar and Zhijun Jiang. Their combined expertise has contributed to the advancement of technologies in the semiconductor industry.

Conclusion

William Pryor's innovative work in developing a virtual sensor for chamber cleaning endpoints showcases his commitment to improving processing technologies. His contributions are vital to the ongoing evolution of semiconductor manufacturing processes.