Oakland, CA, United States of America

William Man-Wai Tong


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations by William Man-Wai Tong

Introduction

William Man-Wai Tong is an accomplished inventor based in Oakland, CA. He has made significant contributions to the field of materials science, particularly in the development of coatings for reflective mask substrates. His innovative approach has led to advancements that enhance defect inspection and surface finishing in semiconductor manufacturing.

Latest Patents

William Man-Wai Tong holds a patent for a process involving coatings on reflective mask substrates. This patent focuses on depositing a coating on one or both sides of a low thermal expansion material EUVL mask substrate. The goal is to improve defect inspection, surface finishing, and defect levels. Additionally, a high dielectric coating is applied to the backside to facilitate electrostatic chucking and correct for any bowing caused by stress imbalances. The process may also involve depositing a film, such as TaSi, to balance stress on the substrate. His innovative work enables improved defect inspection and stress balancing, showcasing his expertise in the field.

Career Highlights

William Man-Wai Tong is affiliated with the University of California, where he continues to contribute to research and development in materials science. His work has garnered attention for its practical applications in the semiconductor industry, particularly in enhancing the performance of mask substrates.

Collaborations

He has collaborated with notable colleagues, including John S. Taylor and Scott Daniel Hector, to further advance research in his field. Their combined expertise has led to significant developments in the technology surrounding mask substrates.

Conclusion

William Man-Wai Tong's innovative contributions to the field of materials science, particularly through his patent on coatings for reflective mask substrates, highlight his role as a leading inventor. His work continues to influence advancements in semiconductor manufacturing, demonstrating the importance of innovation in technology.

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