Company Filing History:
2 out of 54 
1 out of 1 
1 out of 1,024 
Years Active: 1997-1998
Title: The Innovative Contributions of William K. Tucker
Introduction
William K. Tucker is a notable inventor based in Cherry Hill, NJ, who has made significant contributions to the field of semiconductor fabrication. With a total of two patents to his name, Tucker's work focuses on improving gas control systems, which are crucial for the efficiency and safety of semiconductor manufacturing processes.
Latest Patents
Tucker's latest patents include the "Zero Dead-Leg Valve Structure" and the "Zero Dead-Leg Gas Control Apparatus and Method." The Zero Dead-Leg Valve Structure is designed to control the flow of gases in semiconductor fabrication facilities without the presence of dead-legs, which can lead to contamination. This innovative valve structure features a conduit that forms a loop with three ports, utilizing flexible metallic diaphragms to selectively open and close two of the ports.
The Zero Dead-Leg Gas Control Apparatus and Method further enhances this concept by providing a gas cabinet manifold that is free of dead-legs during both the delivery of process gas and the purging of the manifold. This apparatus includes three similar dual valve assembly blocks, each containing two valves with three ports in their chambers. The design allows for efficient gas introduction and venting, utilizing a vacuum venturi or other vacuum sources to manage process gas effectively.
Career Highlights
Throughout his career, Tucker has worked with prominent companies such as Sci Systems, Inc. and Boc Group, Inc. His experience in these organizations has contributed to his expertise in developing innovative solutions for gas control in semiconductor applications.
Collaborations
Tucker has collaborated with various professionals in his field, including Ronald R. DuRoss, enhancing the development of his patented technologies.
Conclusion
William K. Tucker's contributions to the semiconductor industry through his innovative patents demonstrate his commitment to advancing technology in gas control systems. His work continues to influence the efficiency and safety of semiconductor fabrication processes.