Company Filing History:
Years Active: 1984-1985
Title: Inventions of William Jensen: Pioneering High-Resolution Lithographic Resists
Introduction
William Jensen, an accomplished inventor based in Waltham, MA, has made significant contributions to the field of microlithography. With a total of two patents to his name, Jensen has focused on advancing lithographic resist compositions, which are crucial in various applications such as semiconductor manufacturing and microfabrication. His work emphasizes the transformation characteristics of resist materials upon exposure to different forms of radiation, which is essential for developing high-resolution patterns.
Latest Patents
William Jensen's latest patents include:
1. **High resolution lithographic resist and method** - This patent describes a negative working resist composition made from a vinyl polymer featuring aromatic quaternized nitrogen-containing pendant groups. Upon exposure to electron beams, ultraviolet light, or X-rays, the resist transitions from high to low solubility in polar solvents like water or low molecular weight alcohols. The patent also details methods for patterning substrates using this innovative resist composition.
2. **High resolution lithographic resist of negative working cationic vinyl** - Similar to his first patent, this invention describes a negative working resist composition that facilitates the same transformation from high to low solubility in response to radiation exposure. The ability to pattern substrates effectively makes this technology vital in advancing microlithographic processes.
Career Highlights
Jensen's career has been marked by a commitment to innovation in lithography. His tenure at GTE Laboratories Incorporated has positioned him at the forefront of research and development in high-resolution lithographic technologies. His work not only enhances the efficiency of semiconductor production but also expands the possibilities within microfabrication techniques.
Collaborations
Throughout his career, Jensen has collaborated with notable colleagues such as Kang I Lee and Peter Cukor. These partnerships highlight the collaborative nature of research and development in the tech industry, leading to innovations that reshape the boundaries of technology.
Conclusion
William Jensen's contributions to the field of lithographic resists reflect a significant advancement in microlithography techniques. His patents offer promising solutions that enhance the precision and efficacy of substrate patterning processes. The ongoing impact of his work at GTE Laboratories Incorporated continues to be felt within the industry, inspiring future innovations in semiconductor manufacturing and beyond.