Company Filing History:
Years Active: 2000
Title: Innovations of William J Schaffer
Introduction
William J Schaffer is an accomplished inventor based in Atascadero, California. He holds a patent that showcases his expertise in nondestructive layer defect detection. His innovative approach has significant implications for the semiconductor industry.
Latest Patents
William J Schaffer is credited with a patent titled "Method and system for nondestructive layer defect detection." This method involves projecting radiation, such as a laser beam, onto the surface of a layer. The radiation heats the surface, melting a portion of the layer. Impurities within defects are heated, increasing pressure and causing them to emerge through the surface. The layer is then scanned for visible defects created by this emergence. This technology allows for the detection of hidden defects without damaging the underlying features, enabling reworking of semiconductor wafers and resulting in considerable cost savings in integrated circuit chip production.
Career Highlights
William J Schaffer is associated with Xmr, Inc., where he applies his innovative methods to enhance semiconductor manufacturing processes. His work has contributed to advancements in the field, particularly in improving the efficiency and reliability of defect detection.
Collaborations
William collaborates with Jenn Y Liu, leveraging their combined expertise to further develop and refine their technologies.
Conclusion
William J Schaffer’s contributions to nondestructive layer defect detection represent a significant advancement in semiconductor technology. His innovative methods not only improve defect detection but also offer substantial cost savings in production.