Iowa City, IA, United States of America

William C Stwalley


Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 1986-1992

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4 patents (USPTO):Explore Patents

Title: The Innovations of William C. Stwalley

Introduction

William C. Stwalley is a notable inventor based in Iowa City, IA (US). He has made significant contributions to the field of ion synthesis and has been awarded 4 patents for his innovative work. His research focuses on the development of advanced methods for producing cluster ions, which have applications in various scientific fields.

Latest Patents

Stwalley's latest patents include groundbreaking technologies such as "Cluster ion synthesis and confinement in hybrid ion trap arrays." This patent describes a process that utilizes a containerless environment to grow cluster ions of large mass and well-defined distribution in a continuous manner across multiple growth chambers. Another significant patent is titled "Method for the production of size, structure and composition of cluster ions." This method involves using an ionization source to produce ions that are sorted according to velocity and mass, allowing for the creation of coated cluster ions through a gaseous vapor of specified elements.

Career Highlights

Throughout his career, Stwalley has worked with esteemed organizations, including the United States of America as represented by the Secretary of the Air Force and the University of Iowa Research Foundation. His work has contributed to advancements in ion trap technology and cluster ion research.

Collaborations

Stwalley has collaborated with notable colleagues such as John T. Bahns and Mark E. Koch, further enhancing the impact of his research through teamwork and shared expertise.

Conclusion

William C. Stwalley's innovative contributions to the field of ion synthesis and his collaborative efforts with esteemed organizations and colleagues highlight his significant role in advancing scientific research. His patents reflect a commitment to pushing the boundaries of technology and innovation.

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