William C Nunnally

Title: Innovations of William C. Nunnally

Introduction

William C. Nunnally is a notable inventor based in Fort Worth, Texas. He has made significant contributions to the field of plasma discharge technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Nunnally's latest patents include a "Field Controlled Plasma Discharge Printing Device" and a "Field Controlled Plasma Discharge Device." The first patent describes a field-controlled plasma discharge display element designed for use in both single and multiple element plasma discharge electrostatic printers. This device features a pair of hollow discharge electric field electrodes and a third electrode that generates a control electric field. This control electric field is crucial for modulating the intensity of the plasma discharge, allowing for precise image printing. The second patent focuses on a similar display element but is tailored for multiple element plasma displays. It also utilizes a control means to manage the activation and intensity of individual display elements in a matrix configuration.

Career Highlights

William C. Nunnally is affiliated with Old Dominion University, where he continues to contribute to research and development in his field. His work has been instrumental in advancing the technology behind plasma displays and printing devices.

Collaborations

Nunnally has collaborated with Karl H. Schoenbach, a fellow researcher, to further explore the applications of plasma technology.

Conclusion

William C. Nunnally's innovative work in plasma discharge technology has led to significant advancements in the field, making him a prominent figure in the realm of inventions. His contributions continue to influence the development of new technologies in printing and display systems.