Company Filing History:
Years Active: 1987-1990
Title: Wilfried R. Wagner: Innovator in Gas Treatment Technologies
Introduction
Wilfried R. Wagner is a notable inventor based in Basking Ridge, NJ (US). He has made significant contributions to the field of gas treatment technologies, holding a total of 4 patents. His innovative approaches have advanced the methods used in semiconductor wafer processing.
Latest Patents
Wagner's latest patents focus on a gas treatment apparatus and method. This technology involves treating substrates, such as semiconductor wafers, with gas by advancing the substrate along a circular path. The design maintains the substrate's face in a transverse position, allowing the gas to contact the exposed areas effectively. A key feature of this method is the simultaneous treatment of multiple substrates, which act as vanes to create rotational motion in the gas, enhancing the pumping process through the chamber. The substrates are supported on susceptors with planar faces, which also contribute to the gas's rotational dynamics. The gas used can either be a depositing gas for forming epitaxial layers or an etching gas.
Career Highlights
Wagner's career is marked by his role at Emcore Corporation, where he has been instrumental in developing advanced gas treatment technologies. His work has significantly impacted the semiconductor industry, providing innovative solutions for wafer processing.
Collaborations
Wagner has collaborated with notable colleagues, including Norman E. Schumaker and Richard A. Stall. Their combined expertise has contributed to the successful development of various technologies in the field.
Conclusion
Wilfried R. Wagner's contributions to gas treatment technologies exemplify his innovative spirit and dedication to advancing semiconductor processing methods. His patents reflect a commitment to improving efficiency and effectiveness in the industry.