Company Filing History:
Years Active: 1999-2001
Title: The Innovations of Wilbur C. Krusell
Introduction
Wilbur C. Krusell is a notable inventor based in Palo Alto, CA, who has made significant contributions to the field of semiconductor cleaning technologies. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of cleaning semiconductor substrates, which is crucial in the manufacturing of electronic devices.
Latest Patents
Krusell's latest patents include an "Apparatus for cleaning semiconductor substrates" and a "Method and apparatus for cleaning of semiconductor substrates using very dilute Standard Clean 1 (SC1)." Both patents describe a cleaning method that utilizes a brush to apply a diluted SC1 solution to silicon wafers. This innovative delivery system ensures that the chemical solutions are applied uniformly, reducing the volume of chemicals needed during the scrubbing process. The process also converts substrate surfaces from a hydrophobic state to a hydrophilic state, which is essential for effectively removing surface contaminants.
Career Highlights
Throughout his career, Wilbur C. Krusell has worked with several prominent companies in the semiconductor industry, including Ontrak Systems, Inc. and Lam Research Corporation. His experience in these organizations has allowed him to develop and refine his innovative cleaning methods, contributing to advancements in semiconductor manufacturing.
Collaborations
Krusell has collaborated with various professionals in his field, including Diane J. Hymes and Mikhail Ravkin. These collaborations have likely played a role in enhancing his research and development efforts.
Conclusion
Wilbur C. Krusell's contributions to semiconductor cleaning technologies demonstrate his commitment to innovation in the field. His patents reflect a deep understanding of the challenges faced in semiconductor manufacturing and offer practical solutions to improve cleaning processes.