Company Filing History:
Years Active: 1999-2005
Title: Innovator Wesley Phillip Graff: A Leader in Semiconductor Cleaning Technologies
Introduction:
Wesley Phillip Graff, based in Austin, TX, has made significant contributions to the field of semiconductor technology through his innovative approaches to wafer cleaning processes. With a total of three patents to his name, Graff is recognized for his exceptional ability to enhance the quality and efficiency of semiconductor manufacturing.
Latest Patents:
Wesley Phillip Graff's most recent patents focus on advanced methods for cleaning semiconductor wafers. One notable patent, titled "Methods for post polysilicon etch photoresist and polymer removal with minimal gate oxide loss," presents a novel two-step approach for the removal of polymeric and other residues from wafers. This method utilizes dry plasmas generated by microwave, inductively-coupled plasma (ICP), and radio frequency (RF) energy. In this process, wafers are initially treated using a microwave-generated plasma or an ICP, followed by the application of a radio frequency-generated plasma to achieve superior cleaning. By carefully controlling the fluorine concentration in the plasma, Graff's methods offer more precise etch rates compared to conventional cleaning techniques.
Another innovative approach detailed in his patent, "Using hydrogen gas in a post-etch radio frequency-plasma contact cleaning process," addresses the challenge of removing etch byproducts from contact holes while minimizing lateral etching. By introducing a gas mixture reactive to the etch byproducts in a plasma reaction chamber, this method effectively cleans and maintains the integrity of electrical connections within the contact holes.
Career Highlights:
Wesley Graff has worked with prominent companies in the semiconductor industry, including Novellus Systems Incorporated and Motorola Corporation. His tenure at these organizations allowed him to develop and refine his groundbreaking cleaning techniques that have contributed to advancements in semiconductor manufacturing.
Collaborations:
Throughout his career, Graff has collaborated with notable professionals, including coworkers Eddie Chiu and Cindy Wailam Chen. These collaborations have fostered a creative environment that has led to several innovative solutions in the semiconductor field.
Conclusion:
Wesley Phillip Graff's dedication to innovation within semiconductor cleaning technologies highlights his status as a leading inventor in the industry. With a focus on improving wafer cleaning processes, his patents represent a significant leap forward in semiconductor manufacturing efficiency and quality. As the demand for advanced semiconductor devices increases, Graff's contributions will undoubtedly play a crucial role in shaping the future of this vital technology.