Location History:
- Berlin, DE (1989)
- Kleinkahl-Grosslaudenbach, DE (1991)
Company Filing History:
Years Active: 1989-1991
Title: Innovations by Werner Katzschner in Munich, Germany
Introduction
Werner Katzschner is an accomplished inventor located in Munich, Germany. With two notable patents to his name, Katzschner has significantly contributed to the fields of reactive ion beam etching and plasma deposition technologies. His innovative work is essential for advancing applications in various manufacturing and research environments.
Latest Patents
Katzschner's latest patents include a "Particle Source for a Reactive Ion Beam Etching or Plasma Deposition." This invention details a particle source that generates positive, negative, and neutral particles which can be applied to substrates. The particle source consists of a container where gas or gas mixtures are ionized, combined with an electromagnetic wave, preferably microwave irradiation. A torus-shaped magnetic field, generated by permanent magnets or electromagnets, facilitates the process. The invention features a specialized control grid configuration that enables the selection and extraction of particles from the container.
Another notable patent is for an "Apparatus for Mounting Workpieces." This invention focuses on a system for mounting discoidal substrates within a vacuum chamber to allow for reactive ionic etching. The setup includes a substrate holder connected to a hollow shaft and a bottom plate, creating a displaceable cage that holds the substrate in place. This innovation enhances efficiency and precision in processing substrates.
Career Highlights
Katzschner works at Leybold Aktiengesellschaft, a prominent company known for its innovations in vacuum technology. His expertise and creative contributions have positioned him as a key player within the organization, further enhancing its reputation in the industry.
Collaborations
Throughout his career, Katzschner has collaborated with notable colleagues such as Dirk Helms and Anton Pawlakowitsch. These partnerships have fostered an environment of innovation and collective problem-solving, enhancing the scope of their projects.
Conclusion
Werner Katzschner continues to impact the field of innovative technologies through his inventive spirit and dedication to advancing engineering applications. His patents reflect a commitment to excellence and the continuous pursuit of groundbreaking solutions in reactive ion beam etching and plasma deposition.