Wenyang Pan

Title: Wenyang Pan: Innovator in Self-Healing Polymers

Introduction

Wenyang Pan is a notable inventor based in Syracuse, NY (US). He has made significant contributions to the field of materials science, particularly in the development of self-healing polymers. His innovative work has the potential to revolutionize various applications in engineering and materials.

Latest Patents

Wenyang Pan holds a patent for "Shape memory assisted self-healing polymers having load bearing structure." This patent describes a structural shape memory assisted self-healing polymer formed by laminating thin layers of an ionomer, such as a member of the poly(styrene sulfonate) (PSS) family of ionomers, with a WEGP-type SMP, such as atactic poly(styrene) (PS) with molecular weight in the 200 kDa range or alternatively poly(methyl methacrylate) (PMMA) in combination with polycyclooctene (PCO). The self-healing polymer may also comprise an interpenetrating, immiscible polymer network (IPN) based on a blend of polystyrene and polystyrene sulfonate (PSS).

Career Highlights

Wenyang Pan is affiliated with Syracuse University, where he conducts research and develops innovative materials. His work has garnered attention for its practical applications and contributions to the field of polymer science.

Collaborations

Wenyang Pan collaborates with Patrick T Mather, who is also involved in research related to polymers and materials science.

Conclusion

Wenyang Pan's contributions to the field of self-healing polymers highlight his innovative spirit and dedication to advancing materials science. His work continues to inspire future developments in this exciting area of research.