Shenzhen, China

Wenwei Xue

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2024

Loading Chart...
Loading Chart...
2 patents (USPTO):

Title: Innovator Spotlight: Wenwei Xue

Introduction: Wenwei Xue is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of query processing and data source registration methods. With two patents to his name, his innovations stand out in the technology domain.

Latest Patents: Wenwei Xue's latest patents focus on advanced methods for query processing and data source registration. One notable patent describes a method that includes decomposing SQL queries into logical plans based on specific data source features. This process supervises the generation of physical plans and determines the query costs to prioritize execution efficiently. Another patent outlines a similar approach but emphasizes the usage of an internal data source feature library stored within the query engine's cache. Both inventions significantly enhance the performance and efficiency of query processing.

Career Highlights: Wenwei Xue has built a reputable career working with Huawei Technologies Co., Limited, where he continues to innovate in data processing methodologies. His expertise and dedication have contributed to advancing the capabilities of the technologies his company produces.

Collaborations: Throughout his career, Wenwei has collaborated with notable colleagues, including Bing Zhou, Ting Yu, and Cliff Leung. These collaborations have played a crucial role in fostering innovative solutions and enhancing the projects they have worked on together.

Conclusion: Wenwei Xue exemplifies the spirit of innovation within the tech industry. His patents on query processing methods and data source registration are set to impact the landscape of data management significantly. As he continues to work at Huawei Technologies, his contributions will surely further shape the future of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…