Wen-Tung Cheng

Title: Innovations of Wen-Tung Cheng in Photomask Technology.

Introduction

Wen-Tung Cheng is a notable inventor based in Taoyuan Hsien, Taiwan. He has made significant contributions to the field of photomask technology, particularly through his innovative methods for creating photomasks with varying levels of light transmissivity. His work is essential for advancements in optical applications.

Latest Patents

Wen-Tung Cheng holds a patent titled "Method for making photomasks having regions of different light." This patent describes an improved technique for preparing multiple-exposure photomasks that feature at least three levels of transmissivity. The process begins with the formation of a conventional bi-exposure photomask on a transparent substrate, which includes macroscopically exposed, microscopically exposed, and masked areas. A diffractive-refractive light-scattering optical element is then created above the microscopically exposed area to provide an exposure area with intermediate light transmissivity. The method allows for the adjustment of transmissivity by modifying the dimensions and spacing of microscopic openings, enabling the creation of multiple patterns on the same substrate.

Career Highlights

Wen-Tung Cheng is affiliated with the Industrial Technology Research Institute, where he continues to develop innovative solutions in photomask technology. His work has garnered attention for its potential applications in various optical devices and systems.

Collaborations

Wen-Tung Cheng has collaborated with notable colleagues, including Dhei-Jhai Lin and Rong-Jer Lee, who contribute to the research and development efforts in their field.

Conclusion

Wen-Tung Cheng's innovative methods in photomask technology demonstrate his commitment to advancing optical applications. His contributions are vital for the ongoing development of high-performance optical devices.