Wen-Shin Shen

Title: Innovations of Wen-Shin Shen

Introduction

Wen-Shin Shen is a notable inventor based in Hwa-Lien, Taiwan. He has made significant contributions to the field of photographic compositions and polymerization systems. With a total of 2 patents, his work has advanced the technology used in various applications.

Latest Patents

One of his latest patents is an alkaline-solution-developable liquid photographic composition. This composition serves as a permanent protective layer for printed circuit boards and includes an acrylic copolymer with hydroxyl and carboxyl groups, a photo-reactive monomer, a melamine compound, and a free radical photo initiator. Another significant patent involves photosensitive compositions that enhance the photopolymerization rate. This composition is particularly useful in UV-curing coating and image transfer systems, showing remarkable improvements in photosensitivity, especially in systems without protective films.

Career Highlights

Wen-Shin Shen is associated with the Industrial Technology Research Institute, where he has been instrumental in developing innovative solutions in his field. His expertise in creating advanced photographic compositions has positioned him as a key figure in the industry.

Collaborations

Wen-Shin has collaborated with notable coworkers, including Rong-Jer Lee and Chein-Dhau Lee, who have contributed to his research and development efforts.

Conclusion

Wen-Shin Shen's contributions to the field of photographic compositions and polymerization systems highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving the efficiency and effectiveness of various applications in the industry.