Location History:
- Chungho, TW (2001)
- Taipei Hsien, TW (2002)
Company Filing History:
Years Active: 2001-2002
Title: The Innovations of Wen-Chieh Wang
Introduction
Wen-Chieh Wang is a notable inventor based in Chungho, Taiwan. He has made significant contributions to the field of photoresist compositions, holding a total of three patents. His work is recognized for its impact on the technology used in various applications.
Latest Patents
One of his latest patents is focused on an alicyclic compound, specifically a positive photoresist composition containing alicyclic dissolution inhibitors. This innovative composition comprises a polymer, a photoactivated agent, and a dissolution inhibitor represented by a specific formula. This advancement is crucial for improving the efficiency and effectiveness of photoresist materials in various technological applications.
Career Highlights
Wen-Chieh Wang is currently employed at Everlight USA, Inc., where he continues to develop and refine his inventions. His expertise in the field has positioned him as a key player in the industry, contributing to advancements that enhance product performance and reliability.
Collaborations
Throughout his career, Wen-Chieh has collaborated with talented individuals such as Shang-Wern Chang and Yen-Cheng Li. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Wen-Chieh Wang's contributions to the field of photoresist compositions highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to excellence and a drive to push the boundaries of what is possible in his field.