Company Filing History:
Years Active: 2020-2021
Title: Innovations of WeiMin Tao in Lithography Systems
Introduction
WeiMin Tao is an accomplished inventor based in Palo Alto, CA, known for her contributions to the field of lithography systems. With a total of 2 patents, she has made significant advancements that enhance the efficiency and effectiveness of lithography processes.
Latest Patents
WeiMin Tao's latest patents focus on dynamic cooling control for thermal stabilization in lithography systems. The embodiments described provide a system, software application, and methods that aim to decrease stabilization time while writing exposure patterns into photoresist on substrates. One embodiment includes a slab with a stage disposed over it, supported by a pair of supports. The processing apparatus is coupled to the slab and includes a processing unit with multiple image projection systems. Additionally, the chiller system features fluid channels in each track of the pair of tracks, ensuring optimal thermal management during the lithography process.
Career Highlights
WeiMin Tao is currently employed at Applied Materials, Inc., where she continues to innovate and develop cutting-edge technologies in the semiconductor industry. Her work has been instrumental in improving lithography techniques, which are crucial for the production of integrated circuits.
Collaborations
Throughout her career, WeiMin has collaborated with notable colleagues, including Benjamin M Johnston and David Michael Corriveau. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
WeiMin Tao's contributions to lithography systems exemplify her dedication to innovation and excellence in the field. Her patents not only enhance the efficiency of lithography processes but also pave the way for future advancements in semiconductor manufacturing.