Wei Tao

Title: Wei Tao - Innovator in Metalorganic Chemical Vapor Deposition

Introduction

Wei Tao is a notable inventor based in Blacksburg, VA (US). He has made significant contributions to the field of materials science, particularly in the development of advanced deposition techniques for ferroelectric thin films. His innovative work has implications for various electronic applications.

Latest Patents

Wei Tao holds a patent for a method titled "Metalorganic chemical vapor deposition of layered structure oxides." This patent describes a process for fabricating high-quality layered structure oxide ferroelectric thin films. The deposition process involves a chemical reaction between volatile metal organic compounds and other gases in a reactor, resulting in a nonvolatile solid that deposits on a substrate. The source materials for this process include organometallic compounds and oxygen. The reactor used for deposition can be either a hot wall or a cold wall reactor, with vapors introduced through bubblers or a direct liquid injection system. The resulting ferroelectric films have potential applications in capacitors, dielectric resonators, heat sensors, transducers, actuators, nonvolatile memories, optical waveguides, and displays.

Career Highlights

Throughout his career, Wei Tao has worked with prominent companies such as Cera M GmbH and Sharp Corporation. His expertise in chemical vapor deposition has positioned him as a key figure in the development of advanced materials for electronic devices.

Collaborations

Wei Tao has collaborated with esteemed colleagues, including Seshu B Desu and Chien Hsiung Peng. These partnerships have furthered research and innovation in the field of ferroelectric materials.

Conclusion

Wei Tao's contributions to the field of metalorganic chemical vapor deposition have paved the way for advancements in electronic materials. His innovative methods and collaborations continue to influence the development of high-quality ferroelectric thin films.