Company Filing History:
Years Active: 2025
Title: Wei Jin - Innovator in Photolithography
Introduction
Wei Jin is a notable inventor based in Saratoga, CA (US). He has made significant contributions to the field of photolithography, particularly in the development of two-dimensional patterns. His innovative approach utilizes advanced techniques to enhance the capabilities of photolithography.
Latest Patents
Wei Jin holds a patent for a groundbreaking invention titled "Two-dimensional (2D) patterns using multiple exposures of one-dimensional (1D) photolithography masks or holographic interference lithography." This patent describes systems and methods for generating a two-dimensional pattern on a photoresist layer. The process involves exposing a photoresist layer through a first exposure to a unidimensional series of features that alternately provide minima and maxima of illumination intensity along a first dimension. Subsequently, the photoresist layer is exposed via a second exposure to another unidimensional series of features, which provides a second set of minima and maxima along a second dimension, angularly separated by an exposure rotation factor. This innovative method enhances the precision and efficiency of pattern generation in photolithography.
Career Highlights
Wei Jin is currently employed at Google Inc., where he continues to push the boundaries of technology and innovation. His work has been instrumental in advancing the field of photolithography, making significant strides in the development of new techniques and applications.
Collaborations
Wei Jin collaborates with talented individuals such as Lu Tian and Joseph Daniel Lowney. Their combined expertise fosters a creative environment that drives innovation and leads to the development of cutting-edge technologies.
Conclusion
Wei Jin is a prominent inventor whose work in photolithography has paved the way for advancements in the field. His patent and contributions reflect a commitment to innovation and excellence in technology.